| http://www.w3.org/ns/prov#value | - Illustratively, the slurry contains abrasive particles made of material such as silica and an aqueous base such as KOH. As a result, the top surface 105A of monitor wafer 100 is polished by the motion of the polishing pad 440 and monitor wafer 110, and the abrasive action of the silica and chemical action of the basic solution disposed there between.
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