| http://www.w3.org/ns/prov#value | - The algorithm automatically calculates adjustments such as changes tomagnification, field rotation, x and y stage scale, orthogonality, and offset translation in the exposure settings that will enable a more precise placement of the second layer mask 30 over a first layer pattern in first layer 42 in subsequent exposureson other substrates.In the embodiment where the first layer pattern in the fir
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