| http://www.w3.org/ns/prov#value | - Although the insulating layer 624 can be formed using a material such as silicon oxide, silicon oxynitride, silicon nitride oxide, silicon nitride, hafnium oxide, aluminum oxide, or tantalum oxide, it is preferable to form the insulating layer 624 using a material having etching selectivity with respect to a material used for the sidewalls later in order to make the insulating layer 624 serve as a
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