About: http://webisa.webdatacommons.org/333405350

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Accordingly, it will be appreciated that there is a need to improve resist patterning processes for technologies requiring very small feature sizes, such as sub-100 nm CD devices.
http://www.w3.org/ns/prov#wasQuotedFrom	freshpatents.com