About: http://webisa.webdatacommons.org/346552683

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	After refilling a plurality of trenches with n+ doped silicon layer, a planarization process such as CMP is done to form a plain surface using the nitride layer as an etching stopped layer.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com