| http://www.w3.org/ns/prov#value | - Materials such as amorphous or polycrystalline silicon, silicon-germanium alloys, silicon-carbon alloys, and silicon-germanium-carbon alloys can be deposited by physical vapor deposition, non-conformal chemical vapor deposition operating in a mass-transport limited deposition region, or vacuum evaporation, can function as an effective etch mask for etching most dielectric metal oxides with an etch
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