| http://www.w3.org/ns/prov#value | - A method of inspecting and correcting mask patterns according to claim 3, in which said correcting step includes the steps of:coating a photosensitive material on the whole one principal surface of a mask pattern detected to have a defect; sensitizing the photosensitive material corresponding to the defect or the regions except the defect based on the information corresponding to said mask pattern
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