PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • A material mainly containing silicon oxide, silicon nitride or silicon nitride oxide which are obtained with a PCVD method or a sputtering method are used as the gate insulating film 18.
http://www.w3.org/ns/prov#wasQuotedFrom
  • google.com