About: http://webisa.webdatacommons.org/50999150

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The invention thus provides a technique for forming buried conductors in a semiconductor, for example, silicon, substrate which may be used for example as interconnects to various structures and devices in an integrated circuit.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com