| http://www.w3.org/ns/prov#value | - In a first form of the chemical amplification type resist composition of the present invention, the base resin used in the composition as the major component (A) is a polymer of the following rational formula (1): ##STR4## wherein each of R1 and R3 is a hydrogen atom or methyl group, R2 is a tert-butyl group, and letters a and b satisfy a +b =1.
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