| http://www.w3.org/ns/prov#value | - The insulating film 1205 is formed using an insulating material such as a silicon oxide, a silicon nitride, a silicon oxynitride (SiOxNy) (x>y>0), or a silicon nitride oxide (SiNxOy) (x>y>0) by a CVD method, a sputtering method, or the like.
|
