| http://www.w3.org/ns/prov#value | - Conductive layer 104 may include any suitable conductive material such as tungsten or another appropriate metal, heavily doped semiconductor material, a conductive silicide, a conductive silicide-germanide, a conductive germanide, or the like deposited by any suitable method (e.g., chemical vapor deposition (???CVD???), physical vapor deposition (???PVD???), etc.).
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