| http://www.w3.org/ns/prov#value | - Of the various types of high-energy radiation that may be used, the resist composition of the invention is best suited to micro-pattern formation with, in particular, deep-UV rays having a wavelength of 254 to 120 nm, an excimer laser, especially KrF (248 nm), ArF (193 nm), Kr2 (146 nm) or KrAr (134 nm) excimer laser or a laser, especially F2 (157 nm) or Ar2 (126 nm) laser, x-rays, or an electron
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