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An Entity of Type : prov:Entity, within Data Space : wifo5-40.informatik.uni-mannheim.de:8890 associated with source dataset(s)

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  • Of the various types of high-energy radiation that may be used, the resist composition of the invention is best suited to micro-pattern formation with, in particular, deep-UV rays having a wavelength of 254 to 120 nm, an excimer laser, especially KrF (248 nm), ArF (193 nm), Kr2 (146 nm) or KrAr (134 nm) excimer laser or a laser, especially F2 (157 nm) or Ar2 (126 nm) laser, x-rays, or an electron
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