Head noun: lpcvd
| Same concepts |
|---|
| http://dbpedia.org/resource/Chemical_vapor_deposition |
Broader concepts
| label | provenance | confidence |
|---|---|---|
| suitable deposition process | isap:221978964 | 0.447956 |
| cvd method | isap:161282617 | 0.360408 |
| deposition method | isap:161282621 | 0.318155 |
| process | isap:221978961 | 0.282324 |
| method | isap:161282618 | 0.191149 |
| cvd | isap:326517151 | 0.170893 |
Narrower concepts
| label | provenance | confidence |
|---|---|---|
| teo | isap:468234747 | 0.142777 |