Premodifier: deposition
Head noun: method
| Same concepts |
|---|
Broader concepts
| label | provenance | confidence |
|---|---|---|
| deposition method | isap:387628323 | 0.633840 |
| factor | isap:386292501 | 0.555779 |
| method | isap:387628719 | 0.541219 |
| process | isap:442260767 | 0.403204 |
Narrower concepts
| label | provenance | confidence |
|---|---|---|
| vacuum deposition | isap:254346684 | 0.923273 |
| chemical vapor deposition cvd | isap:210983875 | 0.869849 |
| chemical vapor deposition | isap:254346668 | 0.834370 |
| plasma cvd | isap:210983921 | 0.806374 |
| vapor deposition | isap:254346685 | 0.789986 |
| sputtering | isap:257020021 | 0.784570 |
| atomic layer deposition | isap:254346703 | 0.761813 |
| physical vapor deposition pvd | isap:212392376 | 0.743556 |
| electroless plating | isap:273616146 | 0.727546 |
| chemical vapor deposition pecvd | isap:163315213 | 0.724510 |
| chemical vapor | isap:162097429 | 0.697437 |
| thermal evaporation | isap:143245150 | 0.642755 |
| deposition method | isap:387628323 | 0.633840 |
| method | isap:387627600 | 0.530962 |
| pvd | isap:212392370 | 0.505700 |
| cvd | isap:210983874 | 0.503237 |
| plasma | isap:388711997 | 0.486225 |
| evaporation | isap:143245142 | 0.483191 |
| spray | isap:155268686 | 0.401509 |
| pecvd | isap:163315207 | 0.388327 |
| electroplating | isap:54843606 | 0.386862 |
| lpcvd | isap:161282621 | 0.318155 |
| printing | isap:485053704 | 0.303432 |
| ald | isap:212965402 | 0.268321 |
| agent | isap:157362587 | 0.266983 |
| metal | isap:165233704 | 0.223619 |
| coating | isap:272082077 | 0.212450 |