About: chemical vapor deposition cvd

Premodifier: chemical vapor deposition
Head noun: cvd

Same concepts

Broader concepts

label	provenance	confidence
known method	isap:210983878	0.878163
known deposition process	isap:235951243	0.877350
conventional method	isap:210983873	0.869981
deposition method	isap:210983875	0.869849
conventional deposition process	isap:235951239	0.869669
process	isap:235951234	0.859638
technique	isap:264148812	0.859326
suitable deposition technique	isap:264148826	0.855729
deposition process	isap:235951236	0.852275
suitable technique	isap:264148816	0.845975
deposition	isap:237540665	0.835603
know technique	isap:264148823	0.821072
standard deposition technique	isap:264148825	0.814701
many different technique	isap:264148865	0.804841
suitable process	isap:235951241	0.801747
other deposition technique	isap:264148833	0.798532
method	isap:210983869	0.792133
vapor deposition technique	isap:264148836	0.789721
other coating technique	isap:264148840	0.788072
more deposition technique	isap:264148874	0.785369
various deposition technique	isap:264148835	0.778221
conventional deposition technique	isap:264148820	0.777743
suitable deposition process	isap:235951258	0.776179
convenient deposition method	isap:210983922	0.770910
conventional means	isap:465564716	0.765755
know deposition technique	isap:264148847	0.755504
known technique	isap:264148829	0.753224
semiconductor fabrication process	isap:235951262	0.752725
various technique	isap:264148819	0.748511
vapor deposition	isap:237540667	0.744309
known process	isap:235951244	0.740426
other technique	isap:264148839	0.739394
deposition technique	isap:264148813	0.737759
convenient method	isap:210983925	0.737198
other method	isap:210983887	0.731794
appropriate technique	isap:264148860	0.729784
suitable means	isap:465564720	0.717266
several method	isap:210983916	0.702002
vapor phase process	isap:235951264	0.701149
number of conventional process	isap:214031053	0.695599
known deposition method	isap:210983877	0.679646
various method	isap:210983880	0.657903
variety of process	isap:236859667	0.654048
suitable manner	isap:209738322	0.653142
variety of technique	isap:236859668	0.649656
variety of method	isap:236859672	0.642852
number of method	isap:214031047	0.639471
chemical process	isap:235951291	0.639313
system	isap:214681506	0.637472
suitable method	isap:210983884	0.635296
metallization technique	isap:264148831	0.627541
variety of different technique	isap:236859675	0.622997
manufacturing process	isap:235951250	0.622498
number of technique	isap:214031050	0.620676
use method	isap:210983902	0.609982
known manner	isap:209738326	0.603888
molecular beam epitaxy mbe	isap:280358302	0.603583
substrate by technique	isap:263872202	0.567739
conventional technique	isap:264148821	0.556322
combination of method	isap:111794063	0.549311
layer of silicon nitride	isap:469506326	0.537965
metal	isap:466787517	0.518902
vacuum deposition	isap:237540672	0.514150
alternatively	isap:278275759	0.510543
art	isap:280346062	0.497209
means	isap:465564718	0.462927
plasma	isap:210641857	0.460602
cnts	isap:248331490	0.460278
apparatus	isap:263583705	0.450289
substrate	isap:263872200	0.411690
sputtering	isap:238129164	0.386012
use	isap:280378463	0.364225
angstrom	isap:329428994	0.317850
application	isap:111425386	0.309858
cnt	isap:280340394	0.306421
example	isap:232101414	0.273433

Narrower concepts

label	provenance	confidence
chemical vapor deposition lpcvd	isap:326517154	0.826166
low-pressure cvd lpcvd	isap:326517153	0.825165
pressure chemical vapor deposition	isap:401125750	0.818088
atomic layer deposition ald	isap:279116942	0.765064
physical vapor deposition pvd	isap:281752739	0.757360
plasma-enhanced cvd pecvd	isap:325849036	0.741824
atmospheric pressure cvd apcvd	isap:327577622	0.731632
low pressure cvd lpcvd	isap:326517152	0.715700
plasma	isap:403477134	0.633608
low pressure	isap:347926781	0.598257
ammonia	isap:508094245	0.555736
sputtering	isap:401884351	0.540735
cvd chamber	isap:511255676	0.516151
metal	isap:324733400	0.475834
reactor	isap:510643720	0.432012
oxidation	isap:487056248	0.383023
like	isap:125662529	0.376353
process	isap:508863049	0.375655
evaporation	isap:502113443	0.291025
method	isap:404612498	0.218099