Premodifier: atomic layer depositionHead noun: ald
Same concepts |
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Broader concepts
label | provenance | confidence |
---|---|---|
deposition process | isap:232580996 | 0.771809 |
chemical vapor deposition cvd | isap:279116942 | 0.765064 |
method | isap:212965401 | 0.755813 |
technique | isap:264005814 | 0.731299 |
suitable process | isap:232581001 | 0.723757 |
other method | isap:212965403 | 0.722238 |
variety of technique | isap:232324940 | 0.597144 |
several method | isap:212965408 | 0.582144 |
means | isap:467882475 | 0.563971 |
suitable method | isap:212965404 | 0.544181 |
layer | isap:471023023 | 0.456905 |
monolayer | isap:262440045 | 0.350960 |
Narrower concepts
label | provenance | confidence |
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