About: deposition process

Premodifier: deposition
Head noun: process

Same concepts

Broader concepts

label	provenance	confidence
deposition process	isap:433845860	0.870525
process	isap:433845403	0.773612
various process	isap:433846029	0.703766
application	isap:67183601	0.691677
suitable means	isap:38674046	0.653445
technique	isap:321316732	0.442836
advantage	isap:321223475	0.427572
cvd process	isap:433845773	0.400520
method	isap:267023360	0.211289

Narrower concepts

label	provenance	confidence
plasma-assisted chemical vapor deposition	isap:219679954	0.873465
deposition process	isap:433845860	0.870525
atomic layer deposition	isap:219679955	0.867470
chemical vapor deposition cvd	isap:235951236	0.852275
plasma vapor deposition	isap:219679982	0.847764
vapor deposition	isap:219679947	0.833896
chemical vapor deposition	isap:219679919	0.830277
chemical vapor deposition process	isap:433846619	0.814186
molecular beam epitaxy	isap:429379959	0.812754
plasma-assisted cvd	isap:235951242	0.810753
electroless plating	isap:433006448	0.809705
electroless deposition	isap:219679926	0.808416
screen printing	isap:343890719	0.787253
plasma chemical vapor deposition	isap:219680033	0.777287
atomic layer deposition ald	isap:232580996	0.771809
chemical solution deposition	isap:219679921	0.771561
spin coating	isap:433917754	0.768736
spin-on coating	isap:433917767	0.762183
chemical vapor deposition pecvd	isap:222274301	0.762033
ald process	isap:433845912	0.742645
evaporation	isap:138116289	0.735470
physical vapor deposition pvd	isap:234919118	0.730340
ion bombardment	isap:138052440	0.727384
epitaxial growth	isap:449058746	0.718945
reactive sputtering	isap:220677781	0.705421
dip coating	isap:433917806	0.698059
pecvd process	isap:433846371	0.695379
chemical vapor	isap:225014498	0.687619
plating process	isap:433846871	0.684072
sputtering	isap:220677772	0.663832
electron beam evaporation	isap:138116320	0.644404
cvd process	isap:433845647	0.612147
pvd	isap:234919114	0.584192
process	isap:433845417	0.579308
cvd	isap:235951235	0.578774
electroplating	isap:299874679	0.549694
mocvd	isap:229231006	0.516672
electrodeposition	isap:5464281	0.479863
ald	isap:232580997	0.470479
plating	isap:433006447	0.463905
present invention	isap:26626413	0.441525
spraying	isap:343992480	0.434283
tungsten	isap:341546396	0.430286
inkjet	isap:440363213	0.429053
pecvd	isap:222274302	0.425717
printing	isap:343890725	0.403370
film	isap:5863451	0.400616
plasma	isap:447768051	0.396313
rf	isap:29519853	0.393578
vapor	isap:225014500	0.384973
etching	isap:438669784	0.341181
deposition	isap:219679920	0.332627
technique	isap:23933865	0.319125
layer	isap:222184669	0.212646
mbe	isap:233922793	0.192153
c	isap:299542349	0.087848