About: chemical vapor deposition

Premodifier: chemical vapor
Head noun: deposition

Same concepts
http://dbpedia.org/resource/Chemical_vapor_deposition

Broader concepts

label	provenance	confidence
deposition technique	isap:191924693	0.895124
suitable deposition technique	isap:191924700	0.874433
vapor deposition technique	isap:191924717	0.872090
suitable method	isap:254346666	0.858944
known deposition technique	isap:191924748	0.841467
chemical process	isap:219679940	0.839232
know deposition method	isap:254346701	0.837077
deposition method	isap:254346668	0.834370
deposition process	isap:219679919	0.830277
process	isap:219679916	0.829535
conventional deposition technique	isap:191924709	0.828795
known deposition process	isap:219679991	0.824224
suitable technique	isap:191924698	0.823373
method	isap:254346662	0.817119
known method	isap:254346711	0.811402
vapor deposition	isap:400695948	0.811381
film deposition	isap:400695931	0.810026
technique	isap:191924690	0.807707
suitable process	isap:219679918	0.807627
know technique	isap:191924699	0.805793
know method	isap:254346690	0.804791
vacuum deposition	isap:400695936	0.793319
known coating method	isap:254346743	0.781293
variety of deposition technique	isap:218678117	0.778514
processing technique	isap:191924762	0.765164
conventional technique	isap:191924694	0.758517
various technique	isap:191924740	0.757098
different method	isap:254346764	0.756717
known technique	isap:191924730	0.755315
various method	isap:254346689	0.752108
suitable manner	isap:255294230	0.749175
means	isap:474931095	0.730681
process tool	isap:505480514	0.726976
suitable means	isap:474931103	0.724994
thin film technique	isap:191924759	0.723616
known process	isap:219679927	0.722288
semiconductor wafer	isap:475523485	0.713217
coating process	isap:219679980	0.711640
appropriate means	isap:474931111	0.711059
thin film	isap:505948382	0.701335
various vapor deposition process	isap:219679953	0.699278
refractory metal	isap:474861677	0.693368
skill in the art	isap:472829809	0.681937
high temperature process	isap:219679950	0.679093
physical vapor deposition	isap:400695937	0.673158
other method	isap:254346670	0.669928
conventional means	isap:474931106	0.664441
chemical deposition	isap:400695956	0.664318
variety of method	isap:218678108	0.653586
number of method	isap:256390756	0.647653
combination of technique	isap:315061930	0.637013
variety of technique	isap:218678109	0.633613
carbon nanotube	isap:283080632	0.626186
film deposition technique	isap:191924719	0.611504
chemical vapor deposition	isap:400695923	0.587527
polysilicon film	isap:505948389	0.573332
such material	isap:282722746	0.554657
semiconductor	isap:502759448	0.542441
deposition	isap:400695922	0.532760
other process	isap:219679923	0.525861
technology	isap:399628049	0.518017
alternatively	isap:502787922	0.507607
example	isap:219732311	0.500277
substrate	isap:192723801	0.495339
material	isap:282722745	0.461465
sputtering	isap:399913828	0.452013
plasma	isap:254006958	0.449217
deposited	isap:193106520	0.433423
formed	isap:257268987	0.414934
art	isap:401120278	0.413650
polysilicon	isap:314868174	0.337282
instance	isap:283006016	0.332033

Narrower concepts

label	provenance	confidence
atomic layer deposition	isap:400695920	0.882624
chemical vapor deposition	isap:400695923	0.587527
density plasma chemical vapor	isap:259466311	0.516499
mocvd	isap:259897367	0.497611
chamber	isap:245713420	0.489949
silicon	isap:245229955	0.478518
layer	isap:260814023	0.471308
sputtering	isap:399637514	0.328065
diamond	isap:245128854	0.322412
glass	isap:259138325	0.254580
sio2	isap:188260297	0.244630
process	isap:242798523	0.192319