label | provenance | confidence |
inorganic material | isap:459109560 | 0.666353 |
dielectric film | isap:172553048 | 0.655666 |
suitable insulator | isap:287703202 | 0.515406 |
various dielectric layer | isap:85368934 | 0.489639 |
material | isap:459109558 | 0.489098 |
inorganic insulation material | isap:459109615 | 0.486681 |
suitable dielectric material | isap:459109566 | 0.476565 |
suitable material | isap:459109567 | 0.470044 |
suitable insulative material | isap:459109579 | 0.469434 |
dielectric material | isap:459109559 | 0.449640 |
suitable insulator material | isap:459109593 | 0.435433 |
inorganic oxide | isap:94993560 | 0.435125 |
porous inorganic oxide | isap:94993569 | 0.427255 |
protective layer | isap:85368924 | 0.422571 |
transparent material | isap:459109568 | 0.421414 |
variety of dielectric material | isap:9201835 | 0.413678 |
insulator | isap:287703200 | 0.409421 |
different material | isap:459109597 | 0.404607 |
low-k material | isap:459109610 | 0.400010 |
film | isap:172553047 | 0.398111 |
semiconductor material | isap:459109604 | 0.395064 |
porous oxide | isap:94993567 | 0.393138 |
non-magnetic material | isap:459109572 | 0.390882 |
dielectric mask | isap:179294483 | 0.383274 |
composite layer | isap:85368944 | 0.375098 |
lower refractive index material | isap:459109644 | 0.374589 |
metal oxide | isap:94993557 | 0.372476 |
insulative material | isap:459109570 | 0.370834 |
inorganic substrate | isap:285519773 | 0.369990 |
ceramic material | isap:459109574 | 0.369399 |
inorganic oxide carrier | isap:7767077 | 0.366695 |
low dielectric constant | isap:457911558 | 0.364398 |
protective film | isap:172553049 | 0.362379 |
other dielectric material | isap:459109575 | 0.362376 |
variety of oxide | isap:9201834 | 0.353251 |
amorphous oxide | isap:94993578 | 0.352629 |
fig 2b | isap:515890662 | 0.347872 |
suitable dielectric | isap:190162275 | 0.346416 |
gate dielectric | isap:190162271 | 0.341763 |
other inorganic material | isap:459109581 | 0.338554 |
oxide material | isap:459109564 | 0.335910 |
oxide | isap:94993556 | 0.334811 |
dielectric layer | isap:85368920 | 0.333293 |
low refractive index | isap:91352996 | 0.318543 |
major constituent | isap:419498652 | 0.314177 |
inorganic particle | isap:456603368 | 0.312534 |
nonmetal oxide | isap:94993576 | 0.311774 |
low refractive index material | isap:459109580 | 0.311314 |
substance | isap:290912647 | 0.303336 |
other material | isap:459109590 | 0.302203 |
layer 42 | isap:85368936 | 0.299493 |
silicon oxide | isap:94993559 | 0.295988 |
insulation material | isap:459109573 | 0.283669 |
gate oxide | isap:94993562 | 0.279092 |
porous material | isap:459109617 | 0.278057 |
mask material | isap:459109611 | 0.270447 |
interlayer dielectric | isap:190162272 | 0.267900 |
oxide of silicon | isap:94993564 | 0.265332 |
insulator material | isap:459109565 | 0.265226 |
dielectric | isap:190162269 | 0.262439 |
shell | isap:91988710 | 0.255363 |
semiconductor | isap:41727532 | 0.252461 |
sacrificial layer | isap:85368926 | 0.250960 |
resin | isap:89195070 | 0.248763 |
compound | isap:458266220 | 0.248321 |
packaging industry | isap:456731883 | 0.245349 |
chemical vapor deposition | isap:188260297 | 0.244630 |
glass | isap:96168751 | 0.242328 |
dopant | isap:312170519 | 0.240780 |
al2 o3 | isap:515901401 | 0.239551 |
impurity | isap:457764752 | 0.235936 |
surface | isap:3386709 | 0.229222 |
silicate | isap:454502233 | 0.227895 |
layer 5 | isap:85368935 | 0.223693 |
example | isap:5398061 | 0.221276 |
support | isap:7851548 | 0.221147 |
ingredient | isap:190104810 | 0.218838 |
acidic oxide | isap:94993570 | 0.214688 |
layer 3 | isap:85368946 | 0.212473 |
gate insulator | isap:287703206 | 0.211284 |
nonmagnetic material | isap:459109591 | 0.210405 |
oxide layer | isap:85368922 | 0.209250 |
inorganic film | isap:172553056 | 0.208215 |
various additive | isap:454321687 | 0.205850 |
layer | isap:85368919 | 0.202037 |
moreover | isap:458241822 | 0.199243 |
barrier | isap:3051998 | 0.195022 |
polymer | isap:5629771 | 0.194236 |
component | isap:286887143 | 0.193963 |
siox | isap:179037946 | 0.192857 |
filler | isap:305326324 | 0.188118 |
silica | isap:307428612 | 0.187071 |
factor | isap:306122283 | 0.186007 |
mineral | isap:5347157 | 0.185355 |
preferred embodiment | isap:190416781 | 0.184970 |
method | isap:308237226 | 0.175576 |
metal | isap:88356999 | 0.172744 |
respect | isap:2434549 | 0.171206 |
slurry | isap:308194193 | 0.168857 |
gate | isap:172478714 | 0.168592 |
ceramic fiber | isap:87176121 | 0.167314 |
purpose | isap:3728704 | 0.165498 |
fig 3a | isap:515890697 | 0.164446 |
semimetal | isap:286540817 | 0.164266 |
composition | isap:419426934 | 0.163697 |
ceramic | isap:5271482 | 0.163152 |
aluminum | isap:455782363 | 0.162573 |
materials | isap:288875713 | 0.160173 |
sio2 | isap:179038092 | 0.158890 |
combination | isap:416742199 | 0.158741 |
nitride | isap:5244387 | 0.158460 |
polyimide | isap:286336740 | 0.157158 |
zro2 | isap:177970091 | 0.155362 |
amorphous carbon | isap:300594507 | 0.154317 |
furthermore | isap:417739140 | 0.152097 |
particularly | isap:314065212 | 0.147878 |
particle | isap:456603367 | 0.145361 |
substrate | isap:285519770 | 0.142221 |
solid particle | isap:456603369 | 0.140915 |
structure | isap:287247797 | 0.136731 |
silicon nitride | isap:5244388 | 0.134845 |
nm | isap:515901318 | 0.132172 |
mask | isap:179294482 | 0.128729 |
carbon | isap:300594506 | 0.122949 |
alumina | isap:4973096 | 0.119200 |
interaction | isap:419496093 | 0.119195 |
however | isap:3373446 | 0.118818 |
coating | isap:5585821 | 0.115003 |
particular | isap:189342214 | 0.111474 |
formed | isap:301432587 | 0.110932 |
art | isap:127438756 | 0.108172 |
plastic | isap:10301446 | 0.106502 |
first | isap:87220824 | 0.102255 |
silicon | isap:6675304 | 0.100927 |
further | isap:11746776 | 0.097170 |
fluorine | isap:456509880 | 0.096623 |
case | isap:172870486 | 0.092666 |
addition | isap:454317756 | 0.091867 |
sputtering | isap:189040145 | 0.087523 |
result | isap:311471979 | 0.080249 |
embodiment | isap:190416782 | 0.067815 |
al | isap:515899965 | 0.053622 |