About: silicon nitride

Premodifier: silicon
Head noun: nitride

Same concepts
http://dbpedia.org/resource/Silicon_nitride

Broader concepts

label	provenance	confidence
other material	isap:44841550	0.899595
dielectric material	isap:44841541	0.860251
suitable dielectric material	isap:44841568	0.841204
inorganic material	isap:44841544	0.818551
metal oxide	isap:36297135	0.813183
dielectric	isap:242390392	0.809087
dielectric layer	isap:36263079	0.808011
substance	isap:320366621	0.798417
inorganic substance	isap:320366624	0.797639
high dielectric constant material	isap:44841705	0.795215
suitable material	isap:44841545	0.791975
metal nitride	isap:437622636	0.780163
other dielectric material	isap:44841562	0.775429
nitride layer	isap:36263087	0.773077
nonconductive material	isap:44841772	0.750532
amorphous silicon	isap:430722556	0.748988
high thermal conductivity	isap:512455713	0.746161
appropriate dielectric material	isap:44841701	0.739172
passivation layer	isap:36263086	0.737674
advanced material	isap:44841750	0.737194
silicon dioxide	isap:429299794	0.736044
layer	isap:36263077	0.732924
dielectric film	isap:70478753	0.726733
hard mask material	isap:44841595	0.721519
use dielectric material	isap:44841728	0.720518
other dielectric	isap:242390393	0.717147
appropriate material	isap:44841587	0.715638
advanced ceramic	isap:434746381	0.715608
organic material	isap:44841648	0.715295
thin film	isap:70478745	0.707233
inorganic compound	isap:48166248	0.704827
protective layer	isap:36263090	0.704303
several material	isap:44841727	0.704084
similar material	isap:44841647	0.698749
etchable material	isap:44841669	0.694974
suitable dielectric	isap:242390404	0.690916
insulation film	isap:70478754	0.689284
inorganic particle	isap:49470732	0.688085
barrier layer	isap:36263082	0.683634
type of dielectric material	isap:71976267	0.681693
nitride compound	isap:48166241	0.681292
stop layer	isap:36263112	0.679735
nitride	isap:437622623	0.677949
silicon-based material	isap:44841588	0.674856
dielectric layer 12	isap:36263122	0.669416
composite material	isap:44841690	0.667448
different dielectric material	isap:44841657	0.667439
oxide	isap:36297130	0.653095
different material	isap:44841578	0.646428
material for use	isap:44841666	0.645975
ceramic material	isap:44841546	0.643533
material	isap:44841538	0.642430
such material	isap:44841579	0.638034
number of material	isap:272581043	0.636540
alternative material	isap:44841631	0.630947
metal	isap:34011908	0.626749
insulative material	isap:44841560	0.616815
inorganic dielectric material	isap:44841607	0.616732
different dielectric	isap:242390400	0.615609
expensive material	isap:44841659	0.614407
inorganic insulator	isap:316682881	0.611360
diffusion barrier	isap:437346407	0.609912
insulator	isap:316682878	0.607265
silicon nitride	isap:437622656	0.597346
hard mask	isap:72698250	0.584917
ceramic	isap:434746376	0.571274
passivation material	isap:44841593	0.571217
insulation layer	isap:36263110	0.565580
high refractive index	isap:31668261	0.565194
deposit layer	isap:36263143	0.564947
layer of dielectric material	isap:36263085	0.561307
insulative layer	isap:36263146	0.559504
other embodiment	isap:243819584	0.556932
oxynitride	isap:245638299	0.548214
carbide	isap:428797251	0.543633
boride	isap:274315050	0.537556
polycrystalline silicon	isap:430722554	0.536224
rigid material	isap:44841653	0.531267
silicon compound	isap:48166237	0.529028
example	isap:430806075	0.511432
hard material	isap:44841557	0.508413
structure	isap:317722094	0.503916
thin layer	isap:36263125	0.502050
first	isap:39598823	0.499606
transparent material	isap:44841602	0.497717
silicon	isap:430722550	0.495049
spacer layer	isap:36263083	0.491571
silicide	isap:45517407	0.489916
embodiment	isap:243819582	0.489515
first layer	isap:36263128	0.488070
substrate	isap:316107193	0.477820
however	isap:438045054	0.474352
silicon oxide	isap:36297129	0.463528
coating	isap:428383799	0.454213
process	isap:434380080	0.453756
oxidation resistant mask	isap:319277197	0.449395
wafer	isap:35899786	0.439132
mask	isap:72698252	0.437586
composition	isap:65575058	0.411247
nitrogen	isap:51344032	0.401843
etch	isap:70446217	0.395776
also	isap:70832520	0.393524
materials	isap:319002519	0.390912
film	isap:70478736	0.384045
preferably	isap:244142326	0.372015
deposition	isap:244332439	0.363849
hf	isap:56050332	0.361011
art	isap:510256850	0.357465
charge trapping layer	isap:36263124	0.311060
of	isap:56048712	0.296894
exposed	isap:429195621	0.294130
further	isap:438245163	0.275383
alumina	isap:434555079	0.263320
layer 18	isap:36263103	0.247706
furthermore	isap:65784710	0.240710

Narrower concepts

label	provenance	confidence
barium sulfate	isap:431335409	0.692987
other material	isap:344903609	0.619889
silicon oxide	isap:226908797	0.601936
metal oxide	isap:226908805	0.599131
silicon nitride	isap:437622656	0.597346
si3 n4	isap:29663730	0.546483
oxygen	isap:444916102	0.399647
silicon	isap:431582151	0.396964
polysilicon	isap:138235227	0.338017
dielectric	isap:220548049	0.315809
combination	isap:139833809	0.297283
insulator	isap:24274702	0.287874
film	isap:9231317	0.285780
polyimide	isap:27189596	0.260963
application	isap:140138493	0.190178
embodiment	isap:218440703	0.189582
material	isap:344903606	0.176204
si3n4	isap:226963733	0.152399
carbon	isap:449347483	0.150208
example	isap:428855813	0.147015
layer	isap:228209869	0.145914
sio2	isap:5244388	0.134845