About: barrier layer

Premodifier: barrier
Head noun: layer

Same concepts
http://dbpedia.org/resource/Diffusion_barrier

Broader concepts

label	provenance	confidence
oxide layer	isap:370507688	0.843185
dielectric layer	isap:370508274	0.794375
additional layer	isap:370507343	0.783215
more layer	isap:370507909	0.767403
film	isap:199833494	0.757668
other barrier layer	isap:370508004	0.751035
present invention	isap:335566429	0.722270
barrier layer	isap:370507269	0.711217
laminate	isap:291739946	0.694913
coating	isap:228959065	0.688105
other layer	isap:370507470	0.677067
structure	isap:337258104	0.663293
layer of material	isap:370507763	0.628968
layer	isap:370507135	0.572604
application	isap:206736028	0.527062
material	isap:293789275	0.521029
method	isap:158044485	0.516242
surface	isap:224555713	0.490443
thin film	isap:199833604	0.483891
semiconductor	isap:96668020	0.479534
conductor	isap:338190676	0.445280
substrate	isap:336237958	0.432118
area	isap:199528912	0.431815
step	isap:197986451	0.424648
metal	isap:373956503	0.408701
thickness	isap:336175077	0.407044
insulator	isap:338288236	0.400524
electrode	isap:340264394	0.400339
polymer	isap:224055853	0.388333
oxide	isap:368858173	0.342527
titanium nitride	isap:228209881	0.329180
barrier	isap:229835735	0.279400
nitride	isap:228209867	0.216933

Narrower concepts

label	provenance	confidence
second barrier layer	isap:370508866	0.797396
refractory metal	isap:374720483	0.778668
silicon dioxide	isap:31864688	0.760488
barrier layer 14	isap:370510012	0.755306
tantalum nitride	isap:36263081	0.718275
barrier layer	isap:370507269	0.711217
aluminum oxide	isap:371623267	0.709832
nitride tantalum	isap:358994213	0.703328
aluminum al	isap:464758990	0.688733
silicon nitride	isap:36263082	0.683634
gate electrode	isap:13808992	0.671014
inorganic layer	isap:370507529	0.670233
tantalum ta	isap:464868204	0.642862
titanium nitride	isap:36263093	0.595266
titanium nitride tin	isap:469529111	0.588529
oxide of silicon	isap:371623339	0.559479
first barrier layer	isap:370507715	0.549575
dielectric material	isap:360099452	0.543406
titanium oxide	isap:371623463	0.508414
tungsten	isap:360741567	0.463033
metal element	isap:40714610	0.460163
nickel	isap:114983250	0.450277
tantalum	isap:358994211	0.428591
cerium	isap:122006203	0.423322
ruthenium	isap:15485144	0.423031
thickness	isap:15823522	0.403962
copper	isap:119954899	0.397338
nus	isap:467316998	0.390639
tin	isap:469529099	0.374004
layer	isap:370507336	0.367132
alumina	isap:39299799	0.361966
oxide	isap:371623300	0.352534
w	isap:131432370	0.351200
ti	isap:464082071	0.349126
barrier	isap:39409399	0.346907
titanium	isap:359754773	0.313202
example	isap:39989064	0.312389
foil	isap:90982413	0.312357
film	isap:85799716	0.296452
metal	isap:374720458	0.290478
silicon	isap:33838070	0.284018
silica	isap:123419725	0.281617
structure	isap:13236789	0.264920
surface	isap:35985508	0.258548
ag	isap:464388309	0.256980
material	isap:360099239	0.255975
embodiment of the invention	isap:474052896	0.252783
method	isap:123423962	0.195006
plastic	isap:37246930	0.191046
wall	isap:88277984	0.155166
opening	isap:38350120	0.141359