Head noun: etch
Same concepts |
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http://dbpedia.org/resource/Etch |
Broader concepts
label | provenance | confidence |
---|---|---|
anisotropic etch | isap:168689373 | 0.426634 |
parameter | isap:290924920 | 0.371250 |
method | isap:307475485 | 0.351552 |
suitable process | isap:8640882 | 0.349024 |
suitable technique | isap:285959762 | 0.346215 |
plasma process | isap:8640878 | 0.332401 |
wet etch | isap:168689369 | 0.319975 |
etch | isap:168689372 | 0.299852 |
solution of gum | isap:455674808 | 0.273987 |
different process | isap:8640884 | 0.268774 |
process | isap:8640873 | 0.267320 |
technique | isap:285959759 | 0.250912 |
substrate | isap:289915670 | 0.225108 |
dry etch | isap:168689384 | 0.219953 |
structure | isap:289787903 | 0.210263 |
operation | isap:285786696 | 0.210027 |
wafer | isap:87603603 | 0.208769 |
process step | isap:166331402 | 0.208275 |
layer | isap:95005906 | 0.202554 |
chamber | isap:4469662 | 0.201791 |
etchant | isap:7197241 | 0.191791 |
nitric acid | isap:168158448 | 0.189672 |
removed | isap:6865161 | 0.156342 |
material | isap:456068363 | 0.132953 |
Narrower concepts
label | provenance | confidence |
---|---|---|
anisotropic etch | isap:168689382 | 0.476850 |
silicon nitride | isap:70446217 | 0.395776 |
dry etch | isap:168689405 | 0.388464 |
wet etch | isap:168689381 | 0.376341 |
etch | isap:168689372 | 0.299852 |
plasma | isap:489045765 | 0.168630 |
rie | isap:248518773 | 0.151515 |
silicon | isap:73581560 | 0.125164 |
material | isap:383192853 | 0.084976 |
metal | isap:206136044 | 0.057537 |