About: sputtering

Head noun: sputtering

Same concepts
http://dbpedia.org/resource/Sputtering

Broader concepts

label	provenance	confidence
deposition method	isap:257020021	0.784570
deposition technique	isap:192222445	0.777592
conventional method	isap:257020023	0.749659
thin film deposition technique	isap:192222447	0.733872
conventional technique	isap:192222450	0.726320
known method	isap:257020020	0.715199
vacuum technique	isap:192222457	0.676946
vacuum film formation method	isap:257020060	0.668801
method	isap:257020019	0.668456
deposition process	isap:220677772	0.663832
process	isap:220677771	0.659722
well-known technique	isap:192222458	0.648866
vacuum process	isap:220677780	0.636223
thin film form technique	isap:504160364	0.633340
physical vapor deposition pvd	isap:401820922	0.632573
vapor deposition pvd process	isap:220677778	0.625150
technique	isap:192222444	0.619885
suitable deposition method	isap:257020030	0.597939
film-forming technique	isap:192222505	0.597154
vacuum deposition technique	isap:192222451	0.590957
physical vapor deposition	isap:399637510	0.586279
suitable metal deposition technique	isap:192222465	0.581963
vapor phase film deposition	isap:399637520	0.559628
means	isap:473458160	0.550021
physical vapor deposition process	isap:220677775	0.548568
appropriate method	isap:257020027	0.548332
vapor phase deposition technique	isap:192222532	0.544117
thin film deposition method	isap:257020031	0.541576
chemical vapor deposition cvd	isap:401884351	0.540735
vapor deposition pvd technique	isap:192222460	0.540350
physical deposition technique	isap:192222476	0.538879
well-known deposition method	isap:257020055	0.538381
film-forming method	isap:257020035	0.537003
chemical vapor deposition technique	isap:192222516	0.532633
physical vapor deposition technique	isap:192222449	0.529791
pvd method	isap:257020034	0.529295
suitable process	isap:220677773	0.528908
suitable technique	isap:192222448	0.528359
conventional deposition process	isap:220677783	0.525681
suitable thin film technique	isap:192222521	0.524762
vapor deposition pvd method	isap:257020033	0.523717
thin film form process	isap:504160372	0.523002
conventional deposition technique	isap:192222455	0.521956
various processing step	isap:504942423	0.510161
standard deposition technique	isap:192222454	0.508480
know method	isap:257020025	0.504029
vapor deposition process	isap:220677790	0.502528
film form process	isap:504160369	0.501299
various known method	isap:257020073	0.498758
various deposition technique	isap:192222488	0.488917
conventional deposition method	isap:257020053	0.488866
metal deposition process	isap:220677784	0.483834
known technique	isap:192222446	0.482263
metal layer	isap:475506756	0.481687
technology	isap:400194599	0.478881
suitable deposition process	isap:220677788	0.478189
manner	isap:253989512	0.474108
vapor deposition method	isap:257020047	0.474036
known deposition method	isap:257020039	0.469528
vapor deposition technique	isap:192222462	0.466998
present invention	isap:193313289	0.463565
know technique	isap:192222452	0.459736
subtractive process	isap:220677827	0.452344
suitable manner	isap:253989511	0.450539
suitable deposition technique	isap:192222453	0.450363
electrode material	isap:284428709	0.446826
number of fabrication technique	isap:256810616	0.441878
vapor-phase method	isap:257020051	0.441294
process step	isap:504942422	0.441146
thin film technique	isap:192222464	0.441029
conventional means	isap:473458162	0.440076
physical deposition	isap:399637513	0.440049
limited to	isap:278771170	0.439257
well-known method	isap:257020038	0.437168
several method	isap:257020072	0.437117
several technique	isap:192222484	0.437096
skill in the art	isap:475232193	0.436402
thermal process	isap:220677794	0.436074
physical vapor deposition method	isap:257020041	0.434504
other method	isap:257020024	0.427329
similar technique	isap:192222478	0.423929
chemical process	isap:220677825	0.423574
plasma process	isap:220677796	0.423201
various method	isap:257020028	0.421821
various technique	isap:192222467	0.420411
variety of physical vapor	isap:219953467	0.418243
fabrication method	isap:257020077	0.417760
convenient means	isap:473458166	0.415364
film form method	isap:504160362	0.413024
thin film technology	isap:400194598	0.411227
thin-film process	isap:220677799	0.410289
appropriate technique	isap:192222456	0.409666
coating process	isap:220677779	0.408477
metallization process	isap:220677792	0.405039
problem	isap:220506728	0.403144
film technique	isap:192222470	0.402983
chemical deposition	isap:399637525	0.401010
suitable method	isap:257020022	0.399892
known means	isap:473458163	0.398763
chemical technique	isap:192222501	0.396173
vacuum evaporation process	isap:220677808	0.395773
number of technique	isap:256810613	0.391270
suitable means	isap:473458161	0.389143
line of sight deposition	isap:504674515	0.387061
variety of method	isap:219953464	0.385485
vacuum deposited	isap:191908597	0.384399
various process	isap:220677795	0.382962
pvd process	isap:220677776	0.382107
application	isap:315418069	0.381050
various application	isap:315418070	0.379665
known process	isap:220677774	0.378411
deposition technology	isap:400194600	0.367333
variety of technique	isap:219953465	0.367040
suitable procedure	isap:193481723	0.363575
operable technique	isap:192222487	0.362801
similar process	isap:220677791	0.362067
variety of thin film	isap:219953470	0.361624
step	isap:504942420	0.359803
metalization process	isap:220677817	0.358023
number of way	isap:256810614	0.356188
vacuum deposition	isap:399637511	0.355531
convenient technique	isap:192222472	0.352157
film form technique	isap:504160365	0.352036
conductive material	isap:284428704	0.346334
semiconductor layer	isap:475506763	0.344872
physical process	isap:220677798	0.344582
conductive layer	isap:475506755	0.342999
metal coating	isap:218479661	0.330396
chemical vapor deposition	isap:399637514	0.328065
other technique	isap:192222466	0.323359
other means	isap:473458164	0.322387
layer	isap:475506754	0.319754
growth method	isap:257020040	0.318476
various way	isap:401861945	0.313923
additive process	isap:220677806	0.307651
useful means	isap:473458170	0.305894
surface of the substrate	isap:218927077	0.305462
thin film	isap:504160363	0.297666
part	isap:504905393	0.295167
physical deposition method	isap:257020029	0.292634
vacuum deposition method	isap:257020043	0.285999
vapor deposition	isap:399637512	0.274660
substrate	isap:191896702	0.264439
form of a film	isap:504217906	0.263095
variation	isap:191711967	0.258344
vacuum evaporation	isap:315615622	0.253148
layer of metal	isap:475506760	0.251315
surface treatment	isap:193407349	0.249727
pvd	isap:401820921	0.244506
multilayer film	isap:504160377	0.235178
cvd	isap:401884350	0.229797
metal	isap:473283593	0.229129
type	isap:505149153	0.228329
like	isap:504674260	0.227833
fig 1	isap:401838014	0.227550
evaporation	isap:315615620	0.225460
structure	isap:192091490	0.203101
plating	isap:220577910	0.200773
coating	isap:218479660	0.199787
etc	isap:401884023	0.196454
provided	isap:282589493	0.195688
art	isap:401881771	0.190112
formed	isap:255512630	0.187851
electroless plating	isap:220577911	0.183416
other	isap:476272647	0.177819
manufacturing	isap:502980368	0.177547
material	isap:284428703	0.168606
electroplating	isap:40988480	0.166800
sic	isap:401818718	0.163522
surface	isap:218927082	0.162426
example	isap:219840863	0.155196
applied	isap:219188675	0.133118
spin coating	isap:218479662	0.130235
cr	isap:278769852	0.121219
printing	isap:283578486	0.121127
tin	isap:401820438	0.117407
however	isap:219191533	0.115702
instance	isap:285259310	0.112868
glass	isap:475664841	0.106591
cladding	isap:282577447	0.098614
film	isap:504160379	0.093969
cleaning	isap:283114424	0.086198
al	isap:278768971	0.072536
m	isap:41022894	0.049338

Narrower concepts

label	provenance	confidence
reactive sputtering	isap:399383567	0.583748
plasma cvd	isap:238129165	0.452555
chemical vapor deposition	isap:399913828	0.452013
chemical vapor deposition cvd	isap:238129164	0.386012
magnetron sputtering	isap:399383565	0.290611
physical vapor deposition	isap:399913827	0.267852
vacuum	isap:18615241	0.195430
process	isap:242139257	0.151162
aluminum	isap:182432884	0.128668
metal	isap:260694400	0.122853
cvd	isap:238129166	0.101066
magnetron	isap:42080753	0.096428
sio2	isap:189040145	0.087523