| label | provenance | confidence |
|---|
| deposition method | isap:257020021 | 0.784570 |
| deposition technique | isap:192222445 | 0.777592 |
| conventional method | isap:257020023 | 0.749659 |
| thin film deposition technique | isap:192222447 | 0.733872 |
| conventional technique | isap:192222450 | 0.726320 |
| known method | isap:257020020 | 0.715199 |
| vacuum technique | isap:192222457 | 0.676946 |
| vacuum film formation method | isap:257020060 | 0.668801 |
| method | isap:257020019 | 0.668456 |
| deposition process | isap:220677772 | 0.663832 |
| process | isap:220677771 | 0.659722 |
| well-known technique | isap:192222458 | 0.648866 |
| vacuum process | isap:220677780 | 0.636223 |
| thin film form technique | isap:504160364 | 0.633340 |
| physical vapor deposition pvd | isap:401820922 | 0.632573 |
| vapor deposition pvd process | isap:220677778 | 0.625150 |
| technique | isap:192222444 | 0.619885 |
| suitable deposition method | isap:257020030 | 0.597939 |
| film-forming technique | isap:192222505 | 0.597154 |
| vacuum deposition technique | isap:192222451 | 0.590957 |
| physical vapor deposition | isap:399637510 | 0.586279 |
| suitable metal deposition technique | isap:192222465 | 0.581963 |
| vapor phase film deposition | isap:399637520 | 0.559628 |
| means | isap:473458160 | 0.550021 |
| physical vapor deposition process | isap:220677775 | 0.548568 |
| appropriate method | isap:257020027 | 0.548332 |
| vapor phase deposition technique | isap:192222532 | 0.544117 |
| thin film deposition method | isap:257020031 | 0.541576 |
| chemical vapor deposition cvd | isap:401884351 | 0.540735 |
| vapor deposition pvd technique | isap:192222460 | 0.540350 |
| physical deposition technique | isap:192222476 | 0.538879 |
| well-known deposition method | isap:257020055 | 0.538381 |
| film-forming method | isap:257020035 | 0.537003 |
| chemical vapor deposition technique | isap:192222516 | 0.532633 |
| physical vapor deposition technique | isap:192222449 | 0.529791 |
| pvd method | isap:257020034 | 0.529295 |
| suitable process | isap:220677773 | 0.528908 |
| suitable technique | isap:192222448 | 0.528359 |
| conventional deposition process | isap:220677783 | 0.525681 |
| suitable thin film technique | isap:192222521 | 0.524762 |
| vapor deposition pvd method | isap:257020033 | 0.523717 |
| thin film form process | isap:504160372 | 0.523002 |
| conventional deposition technique | isap:192222455 | 0.521956 |
| various processing step | isap:504942423 | 0.510161 |
| standard deposition technique | isap:192222454 | 0.508480 |
| know method | isap:257020025 | 0.504029 |
| vapor deposition process | isap:220677790 | 0.502528 |
| film form process | isap:504160369 | 0.501299 |
| various known method | isap:257020073 | 0.498758 |
| various deposition technique | isap:192222488 | 0.488917 |
| conventional deposition method | isap:257020053 | 0.488866 |
| metal deposition process | isap:220677784 | 0.483834 |
| known technique | isap:192222446 | 0.482263 |
| metal layer | isap:475506756 | 0.481687 |
| technology | isap:400194599 | 0.478881 |
| suitable deposition process | isap:220677788 | 0.478189 |
| manner | isap:253989512 | 0.474108 |
| vapor deposition method | isap:257020047 | 0.474036 |
| known deposition method | isap:257020039 | 0.469528 |
| vapor deposition technique | isap:192222462 | 0.466998 |
| present invention | isap:193313289 | 0.463565 |
| know technique | isap:192222452 | 0.459736 |
| subtractive process | isap:220677827 | 0.452344 |
| suitable manner | isap:253989511 | 0.450539 |
| suitable deposition technique | isap:192222453 | 0.450363 |
| electrode material | isap:284428709 | 0.446826 |
| number of fabrication technique | isap:256810616 | 0.441878 |
| vapor-phase method | isap:257020051 | 0.441294 |
| process step | isap:504942422 | 0.441146 |
| thin film technique | isap:192222464 | 0.441029 |
| conventional means | isap:473458162 | 0.440076 |
| physical deposition | isap:399637513 | 0.440049 |
| limited to | isap:278771170 | 0.439257 |
| well-known method | isap:257020038 | 0.437168 |
| several method | isap:257020072 | 0.437117 |
| several technique | isap:192222484 | 0.437096 |
| skill in the art | isap:475232193 | 0.436402 |
| thermal process | isap:220677794 | 0.436074 |
| physical vapor deposition method | isap:257020041 | 0.434504 |
| other method | isap:257020024 | 0.427329 |
| similar technique | isap:192222478 | 0.423929 |
| chemical process | isap:220677825 | 0.423574 |
| plasma process | isap:220677796 | 0.423201 |
| various method | isap:257020028 | 0.421821 |
| various technique | isap:192222467 | 0.420411 |
| variety of physical vapor | isap:219953467 | 0.418243 |
| fabrication method | isap:257020077 | 0.417760 |
| convenient means | isap:473458166 | 0.415364 |
| film form method | isap:504160362 | 0.413024 |
| thin film technology | isap:400194598 | 0.411227 |
| thin-film process | isap:220677799 | 0.410289 |
| appropriate technique | isap:192222456 | 0.409666 |
| coating process | isap:220677779 | 0.408477 |
| metallization process | isap:220677792 | 0.405039 |
| problem | isap:220506728 | 0.403144 |
| film technique | isap:192222470 | 0.402983 |
| chemical deposition | isap:399637525 | 0.401010 |
| suitable method | isap:257020022 | 0.399892 |
| known means | isap:473458163 | 0.398763 |
| chemical technique | isap:192222501 | 0.396173 |
| vacuum evaporation process | isap:220677808 | 0.395773 |
| number of technique | isap:256810613 | 0.391270 |
| suitable means | isap:473458161 | 0.389143 |
| line of sight deposition | isap:504674515 | 0.387061 |
| variety of method | isap:219953464 | 0.385485 |
| vacuum deposited | isap:191908597 | 0.384399 |
| various process | isap:220677795 | 0.382962 |
| pvd process | isap:220677776 | 0.382107 |
| application | isap:315418069 | 0.381050 |
| various application | isap:315418070 | 0.379665 |
| known process | isap:220677774 | 0.378411 |
| deposition technology | isap:400194600 | 0.367333 |
| variety of technique | isap:219953465 | 0.367040 |
| suitable procedure | isap:193481723 | 0.363575 |
| operable technique | isap:192222487 | 0.362801 |
| similar process | isap:220677791 | 0.362067 |
| variety of thin film | isap:219953470 | 0.361624 |
| step | isap:504942420 | 0.359803 |
| metalization process | isap:220677817 | 0.358023 |
| number of way | isap:256810614 | 0.356188 |
| vacuum deposition | isap:399637511 | 0.355531 |
| convenient technique | isap:192222472 | 0.352157 |
| film form technique | isap:504160365 | 0.352036 |
| conductive material | isap:284428704 | 0.346334 |
| semiconductor layer | isap:475506763 | 0.344872 |
| physical process | isap:220677798 | 0.344582 |
| conductive layer | isap:475506755 | 0.342999 |
| metal coating | isap:218479661 | 0.330396 |
| chemical vapor deposition | isap:399637514 | 0.328065 |
| other technique | isap:192222466 | 0.323359 |
| other means | isap:473458164 | 0.322387 |
| layer | isap:475506754 | 0.319754 |
| growth method | isap:257020040 | 0.318476 |
| various way | isap:401861945 | 0.313923 |
| additive process | isap:220677806 | 0.307651 |
| useful means | isap:473458170 | 0.305894 |
| surface of the substrate | isap:218927077 | 0.305462 |
| thin film | isap:504160363 | 0.297666 |
| part | isap:504905393 | 0.295167 |
| physical deposition method | isap:257020029 | 0.292634 |
| vacuum deposition method | isap:257020043 | 0.285999 |
| vapor deposition | isap:399637512 | 0.274660 |
| substrate | isap:191896702 | 0.264439 |
| form of a film | isap:504217906 | 0.263095 |
| variation | isap:191711967 | 0.258344 |
| vacuum evaporation | isap:315615622 | 0.253148 |
| layer of metal | isap:475506760 | 0.251315 |
| surface treatment | isap:193407349 | 0.249727 |
| pvd | isap:401820921 | 0.244506 |
| multilayer film | isap:504160377 | 0.235178 |
| cvd | isap:401884350 | 0.229797 |
| metal | isap:473283593 | 0.229129 |
| type | isap:505149153 | 0.228329 |
| like | isap:504674260 | 0.227833 |
| fig 1 | isap:401838014 | 0.227550 |
| evaporation | isap:315615620 | 0.225460 |
| structure | isap:192091490 | 0.203101 |
| plating | isap:220577910 | 0.200773 |
| coating | isap:218479660 | 0.199787 |
| etc | isap:401884023 | 0.196454 |
| provided | isap:282589493 | 0.195688 |
| art | isap:401881771 | 0.190112 |
| formed | isap:255512630 | 0.187851 |
| electroless plating | isap:220577911 | 0.183416 |
| other | isap:476272647 | 0.177819 |
| manufacturing | isap:502980368 | 0.177547 |
| material | isap:284428703 | 0.168606 |
| electroplating | isap:40988480 | 0.166800 |
| sic | isap:401818718 | 0.163522 |
| surface | isap:218927082 | 0.162426 |
| example | isap:219840863 | 0.155196 |
| applied | isap:219188675 | 0.133118 |
| spin coating | isap:218479662 | 0.130235 |
| cr | isap:278769852 | 0.121219 |
| printing | isap:283578486 | 0.121127 |
| tin | isap:401820438 | 0.117407 |
| however | isap:219191533 | 0.115702 |
| instance | isap:285259310 | 0.112868 |
| glass | isap:475664841 | 0.106591 |
| cladding | isap:282577447 | 0.098614 |
| film | isap:504160379 | 0.093969 |
| cleaning | isap:283114424 | 0.086198 |
| al | isap:278768971 | 0.072536 |
| m | isap:41022894 | 0.049338 |
