About: surface of the substrate

Head noun: surface
Postmodifier: of the substrate

Same concepts

Broader concepts

label	provenance	confidence
surface of the substrate	isap:438543613	0.709017
surface	isap:438543590	0.703552
technique	isap:316147217	0.675204
flat surface	isap:438543872	0.571865
portion of the substrate	isap:430630698	0.495499
outer surface	isap:438544899	0.455505
means	isap:35568272	0.373147
layer	isap:35985407	0.360653
substrate	isap:318206972	0.317885
method	isap:274018487	0.305830
measure	isap:437087666	0.294031
feature	isap:434034619	0.249872
material	isap:44656963	0.248333
place	isap:36030921	0.177447
b	isap:124607226	0.172401

Narrower concepts

label	provenance	confidence
exterior surface	isap:438544023	0.777181
surface of the substrate	isap:438543613	0.709017
silicon oxide	isap:231134241	0.618996
surface 310	isap:438544435	0.609303
surface	isap:438543557	0.583870
gate electrode	isap:26421183	0.582565
channel region	isap:448528978	0.564584
display region	isap:448528973	0.563685
first region	isap:448528949	0.539629
pixel electrode	isap:26421187	0.502215
portion of the surface	isap:435750000	0.468602
portion of the gate	isap:435749968	0.454073
etching process	isap:437016426	0.430789
portion of the substrate	isap:435749920	0.419596
convex portion	isap:435750021	0.413254
region	isap:448528893	0.407977
wall of the hole	isap:3435333	0.403672
metal	isap:224476620	0.399730
material	isap:343010146	0.395347
substrate	isap:26400629	0.377861
side	isap:3533825	0.372934
element	isap:435592156	0.372001
laser	isap:226665046	0.371728
cavity	isap:439357762	0.341830
copper	isap:442214128	0.337229
etching	isap:428492981	0.327806
opening	isap:436798706	0.318639
trench	isap:441108354	0.317536
step	isap:9869423	0.316432
layer	isap:224555703	0.307880
reference	isap:26262200	0.306941
sputtering	isap:218927077	0.305462
portion	isap:435749878	0.296842
end	isap:233655542	0.291203
cell	isap:9436360	0.281075
area	isap:3495704	0.253942
image	isap:228700715	0.253665
gate	isap:11033624	0.237332
film	isap:2338167	0.230165
process	isap:437016414	0.224434
void	isap:10987306	0.221557
example	isap:430313203	0.219870
edge	isap:12199504	0.178932
electrode	isap:26421204	0.177928
method	isap:440503903	0.153286
ceramic	isap:433007012	0.039667