Premodifier: etchingHead noun: process
Same concepts |
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Broader concepts
label | provenance | confidence |
---|---|---|
suitable process | isap:433845496 | 0.840154 |
etching process | isap:433846783 | 0.783622 |
process | isap:433845361 | 0.774445 |
different process | isap:433845925 | 0.731636 |
method | isap:267023236 | 0.720868 |
plasma process | isap:433845779 | 0.691410 |
suitable technique | isap:321316747 | 0.600805 |
present invention | isap:317506784 | 0.506868 |
procedure | isap:319673757 | 0.472611 |
example | isap:432840936 | 0.447967 |
surface of the substrate | isap:437016426 | 0.430789 |
art | isap:508853120 | 0.411461 |
Narrower concepts
label | provenance | confidence |
---|---|---|
plasma etching | isap:438669747 | 0.846058 |
etching process | isap:433846783 | 0.783622 |
reactive-ion etching rie | isap:235716775 | 0.736179 |
isotropic etching process | isap:433846353 | 0.675903 |
wet etching | isap:438669766 | 0.662095 |
dry etching | isap:438669757 | 0.657486 |
process | isap:433845378 | 0.607196 |
ion-milling | isap:139143417 | 0.418987 |
rie | isap:235716766 | 0.298461 |
etc | isap:232802842 | 0.236039 |
chemical | isap:345771944 | 0.233990 |
etching | isap:438669825 | 0.222013 |
layer | isap:222184656 | 0.140011 |
gas | isap:235983214 | 0.115440 |