Premodifier: etchingHead noun: process
| Same concepts |
|---|
Broader concepts
| label | provenance | confidence |
|---|---|---|
| suitable process | isap:433845496 | 0.840154 |
| etching process | isap:433846783 | 0.783622 |
| process | isap:433845361 | 0.774445 |
| different process | isap:433845925 | 0.731636 |
| method | isap:267023236 | 0.720868 |
| plasma process | isap:433845779 | 0.691410 |
| suitable technique | isap:321316747 | 0.600805 |
| present invention | isap:317506784 | 0.506868 |
| procedure | isap:319673757 | 0.472611 |
| example | isap:432840936 | 0.447967 |
| surface of the substrate | isap:437016426 | 0.430789 |
| art | isap:508853120 | 0.411461 |
Narrower concepts
| label | provenance | confidence |
|---|---|---|
| plasma etching | isap:438669747 | 0.846058 |
| etching process | isap:433846783 | 0.783622 |
| reactive-ion etching rie | isap:235716775 | 0.736179 |
| isotropic etching process | isap:433846353 | 0.675903 |
| wet etching | isap:438669766 | 0.662095 |
| dry etching | isap:438669757 | 0.657486 |
| process | isap:433845378 | 0.607196 |
| ion-milling | isap:139143417 | 0.418987 |
| rie | isap:235716766 | 0.298461 |
| etc | isap:232802842 | 0.236039 |
| chemical | isap:345771944 | 0.233990 |
| etching | isap:438669825 | 0.222013 |
| layer | isap:222184656 | 0.140011 |
| gas | isap:235983214 | 0.115440 |