Premodifier: dryHead noun: etching
Same concepts |
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http://dbpedia.org/resource/Dry_etching |
Broader concepts
label | provenance | confidence |
---|---|---|
method | isap:267662974 | 0.894623 |
technique | isap:318270244 | 0.838019 |
suitable etching technique | isap:318270314 | 0.772146 |
suitable etching process | isap:438669803 | 0.756741 |
etching technique | isap:318270318 | 0.738798 |
suitable technique | isap:318270299 | 0.695976 |
known technique | isap:318270287 | 0.683162 |
suitable process | isap:438669799 | 0.678295 |
known method | isap:267662998 | 0.672040 |
etching process | isap:438669757 | 0.657486 |
known process | isap:438669800 | 0.643071 |
etching method | isap:267663002 | 0.619131 |
process | isap:438669741 | 0.610626 |
processing step | isap:76529257 | 0.589821 |
variety of technique | isap:435620796 | 0.588912 |
advance in specific semiconductor | isap:436083408 | 0.568599 |
step | isap:76529242 | 0.472740 |
etching | isap:429460384 | 0.463355 |
example | isap:434717711 | 0.440772 |
Narrower concepts
label | provenance | confidence |
---|---|---|
reactive ion etch rie | isap:233957238 | 0.856579 |
reactive ion etching | isap:429460381 | 0.691030 |
plasma etching | isap:429460382 | 0.585354 |
etching | isap:429460389 | 0.365956 |
rie | isap:233996201 | 0.250824 |
selectivity | isap:138422421 | 0.231937 |
icp | isap:235209188 | 0.177094 |
process | isap:436788705 | 0.090344 |