Premodifier: dryHead noun: etching
| Same concepts |
|---|
| http://dbpedia.org/resource/Dry_etching |
Broader concepts
| label | provenance | confidence |
|---|---|---|
| method | isap:267662974 | 0.894623 |
| technique | isap:318270244 | 0.838019 |
| suitable etching technique | isap:318270314 | 0.772146 |
| suitable etching process | isap:438669803 | 0.756741 |
| etching technique | isap:318270318 | 0.738798 |
| suitable technique | isap:318270299 | 0.695976 |
| known technique | isap:318270287 | 0.683162 |
| suitable process | isap:438669799 | 0.678295 |
| known method | isap:267662998 | 0.672040 |
| etching process | isap:438669757 | 0.657486 |
| known process | isap:438669800 | 0.643071 |
| etching method | isap:267663002 | 0.619131 |
| process | isap:438669741 | 0.610626 |
| processing step | isap:76529257 | 0.589821 |
| variety of technique | isap:435620796 | 0.588912 |
| advance in specific semiconductor | isap:436083408 | 0.568599 |
| step | isap:76529242 | 0.472740 |
| etching | isap:429460384 | 0.463355 |
| example | isap:434717711 | 0.440772 |
Narrower concepts
| label | provenance | confidence |
|---|---|---|
| reactive ion etch rie | isap:233957238 | 0.856579 |
| reactive ion etching | isap:429460381 | 0.691030 |
| plasma etching | isap:429460382 | 0.585354 |
| etching | isap:429460389 | 0.365956 |
| rie | isap:233996201 | 0.250824 |
| selectivity | isap:138422421 | 0.231937 |
| icp | isap:235209188 | 0.177094 |
| process | isap:436788705 | 0.090344 |