Premodifier: dryHead noun: etching
| Same concepts | 
|---|
| http://dbpedia.org/resource/Dry_etching | 
Broader concepts
| label | provenance | confidence | 
|---|---|---|
| method | isap:267662974 | 0.894623 | 
| technique | isap:318270244 | 0.838019 | 
| suitable etching technique | isap:318270314 | 0.772146 | 
| suitable etching process | isap:438669803 | 0.756741 | 
| etching technique | isap:318270318 | 0.738798 | 
| suitable technique | isap:318270299 | 0.695976 | 
| known technique | isap:318270287 | 0.683162 | 
| suitable process | isap:438669799 | 0.678295 | 
| known method | isap:267662998 | 0.672040 | 
| etching process | isap:438669757 | 0.657486 | 
| known process | isap:438669800 | 0.643071 | 
| etching method | isap:267663002 | 0.619131 | 
| process | isap:438669741 | 0.610626 | 
| processing step | isap:76529257 | 0.589821 | 
| variety of technique | isap:435620796 | 0.588912 | 
| advance in specific semiconductor | isap:436083408 | 0.568599 | 
| step | isap:76529242 | 0.472740 | 
| etching | isap:429460384 | 0.463355 | 
| example | isap:434717711 | 0.440772 | 
Narrower concepts
| label | provenance | confidence | 
|---|---|---|
| reactive ion etch rie | isap:233957238 | 0.856579 | 
| reactive ion etching | isap:429460381 | 0.691030 | 
| plasma etching | isap:429460382 | 0.585354 | 
| etching | isap:429460389 | 0.365956 | 
| rie | isap:233996201 | 0.250824 | 
| selectivity | isap:138422421 | 0.231937 | 
| icp | isap:235209188 | 0.177094 | 
| process | isap:436788705 | 0.090344 |