About: semiconductor wafer

Premodifier: semiconductor
Head noun: wafer

Same concepts
http://dbpedia.org/resource/Wafer_(electronics)

Broader concepts

label	provenance	confidence
article	isap:223293768	0.834863
semiconductor device	isap:158466153	0.812652
item	isap:195211565	0.808825
device	isap:158466154	0.802669
component	isap:339732202	0.798602
microelectronic substrate	isap:337963181	0.789102
substrate assembly	isap:296165529	0.780405
semiconductor workpiece	isap:339165117	0.768282
fabrication process	isap:229794448	0.766069
type of substrate	isap:196922147	0.759891
semiconductor substrate	isap:337963171	0.757395
semiconductor component	isap:339732207	0.752668
brittle material	isap:293552869	0.747175
object	isap:155575900	0.746686
semiconductor product	isap:230239413	0.746052
planar workpiece	isap:339165120	0.744677
electronic substrate	isap:337963185	0.744178
thin solid article	isap:223293771	0.742109
silicon substrate	isap:337963238	0.734572
work piece	isap:369244608	0.731063
electronic device substrate	isap:337963227	0.728771
electronic device	isap:158466156	0.718678
semiconductor wafer	isap:374378889	0.718033
flat media	isap:373454312	0.717646
microelectronic workpiece	isap:339165114	0.715598
microelectronic device	isap:158466167	0.714012
disk-shaped workpiece	isap:339165121	0.710624
microelectronic element	isap:228601667	0.709358
base material	isap:293552855	0.707048
suitable substrate	isap:337963196	0.703640
thermal treatment of substrate	isap:338133547	0.690466
part	isap:195808176	0.690175
such substrate	isap:337963215	0.676951
flat workpiece	isap:339165116	0.673614
photosensitive substrate	isap:337963183	0.664069
substrate	isap:337963165	0.659836
application	isap:208435031	0.657854
wafer-shaped article	isap:223293780	0.657173
substrate processing system	isap:164480692	0.647789
surface of substrate	isap:223625129	0.640780
other material	isap:293552862	0.636463
target	isap:161603059	0.634291
substrate surface	isap:223625140	0.630890
material	isap:293552841	0.613014
various substrate	isap:337963246	0.605242
sign inadvanced patent searchpatentsmethod	isap:163835686	0.605104
substrate 14	isap:337963206	0.605081
workpiece	isap:339165112	0.602472
thin disk	isap:195511857	0.597374
manipulation of multiple object	isap:427835568	0.595783
glass substrate	isap:337963304	0.591686
semiconductor chip	isap:195473593	0.580647
product	isap:230239411	0.570654
plasma processing apparatus	isap:335647347	0.567828
structure	isap:336793957	0.565901
sample	isap:163703373	0.565777
surface of object	isap:223625143	0.565590
other substrate	isap:337963268	0.542957
wafer	isap:374378886	0.537041
integrate circuit	isap:231205600	0.530280
uspto assignment	isap:257987190	0.528407
element	isap:228601665	0.525326
processing of wafer	isap:258791486	0.521331
present invention	isap:338986944	0.515038
substrate 2	isap:337963235	0.510642
fig 1	isap:326439987	0.501138
variety of substrate	isap:228823999	0.500800
oxide layer	isap:369260582	0.493718
polished workpiece	isap:339165136	0.490801
surface of a substrate	isap:223625120	0.489777
cleaning	isap:296224504	0.478039
substance	isap:339493249	0.477922
step	isap:197020775	0.469709
improved method	isap:153635537	0.467528
circuit	isap:231205598	0.460856
slice of semiconductor material	isap:366213137	0.451573
disk-shaped substrate	isap:337963296	0.451474
wafer-shaped object	isap:155575905	0.445941
surface of a workpiece	isap:223625123	0.437287
cmp process	isap:229794449	0.435860
surface of a object	isap:223625122	0.433985
surface	isap:223625121	0.432366
specimen	isap:295477790	0.410053
embodiment	isap:259696460	0.407692
container	isap:339138806	0.407176
polished	isap:295901331	0.365413
cmp	isap:326468211	0.364380
coating	isap:225965493	0.364284
like	isap:196177226	0.356798
layer	isap:369260572	0.352332
method	isap:153635529	0.350920
process	isap:229794447	0.330729
semiconductor	isap:96597786	0.321848
example	isap:226254743	0.310841
however	isap:230951280	0.306612
treatment	isap:338133546	0.294891
defect	isap:158574444	0.293690
result	isap:153445760	0.287896
particle	isap:297187510	0.284725
apparatus	isap:335647340	0.276237
system	isap:164480690	0.272554
problem	isap:229732449	0.261794
inspection	isap:260942413	0.246725
number	isap:161456795	0.224121
sample 1	isap:163703383	0.201890
machine	isap:228029466	0.200795
invention	isap:338986947	0.191818
use	isap:326408371	0.186090

Narrower concepts

label	provenance	confidence
gallium arsenide wafer	isap:374378890	0.795248
gallium arsenide	isap:360284540	0.725663
semiconductor wafer	isap:374378889	0.718033
chemical vapor deposition	isap:475523485	0.713217
integrate circuit	isap:32732506	0.695009
silicon wafer	isap:374378884	0.673140
preferred embodiment	isap:474859474	0.665072
glass substrate	isap:15880886	0.647195
first substrate	isap:15880875	0.608176
second substrate	isap:15880889	0.607074
silicon	isap:38143158	0.574177
adhesive film	isap:88901093	0.537869
wafer 21	isap:374378963	0.505244
silicon substrate	isap:15880930	0.496187
substrate 10	isap:15880921	0.466955
wafer	isap:374378887	0.440001
ic	isap:464072385	0.434329
microprocessor	isap:131205850	0.403395
transistor	isap:474346997	0.398404
gaa	isap:469788777	0.393036
fig 1	isap:469959691	0.392459
circuit	isap:32732508	0.383230
water	isap:371285737	0.374526
microchip	isap:15045548	0.373984
example	isap:37483073	0.368774
si	isap:464038313	0.355023
surface of the wafer	isap:35291317	0.350141
array	isap:367224124	0.332503
surface	isap:35291314	0.328885
particle	isap:363460972	0.318048
structure	isap:14265600	0.317033
reticle	isap:36989151	0.298724
like	isap:89489593	0.283663
mm	isap:463909014	0.274620
material	isap:363764656	0.262574
plurality	isap:14825375	0.254995
fig 3	isap:469959696	0.235951
substrate	isap:15880852	0.233065
film	isap:88901092	0.220451
device	isap:121922257	0.200617
workpiece	isap:17324576	0.186255
laser	isap:365546219	0.184470
lcd	isap:465647682	0.181118
case	isap:96207829	0.172807
carrier	isap:40422424	0.164876
etching	isap:34460054	0.161778
method	isap:118826137	0.153267
nitrogen	isap:363156418	0.135929
invention	isap:14025648	0.128722
apparatus	isap:14766762	0.106385