Premodifier: substrateHead noun: surface
| Same concepts |
|---|
Broader concepts
| label | provenance | confidence |
|---|---|---|
| surface | isap:438543609 | 0.647996 |
| substrate surface | isap:438543633 | 0.618192 |
| substrate | isap:318206967 | 0.605476 |
| method | isap:274018464 | 0.520742 |
| material | isap:44657088 | 0.488618 |
| plane | isap:36028664 | 0.429383 |
| layer | isap:35985468 | 0.425386 |
| factor | isap:276031753 | 0.401517 |
| direction | isap:316048442 | 0.308810 |
| problem | isap:435625882 | 0.298120 |
| nanostructure | isap:145723428 | 0.282340 |
Narrower concepts
| label | provenance | confidence |
|---|---|---|
| semiconductor wafer | isap:223625140 | 0.630890 |
| present invention | isap:27163297 | 0.622458 |
| substrate surface | isap:438543633 | 0.618192 |
| electrode | isap:26421188 | 0.438936 |
| metal | isap:224476633 | 0.411540 |
| wall | isap:3435286 | 0.385926 |
| layer | isap:224555734 | 0.334906 |
| surface | isap:438543577 | 0.313346 |
| portion | isap:435750002 | 0.294200 |
| area | isap:3495724 | 0.293607 |
| glass | isap:228297403 | 0.289715 |
| oxide | isap:231134226 | 0.245864 |
| process | isap:437016423 | 0.229932 |
| material | isap:343010157 | 0.212602 |
| c | isap:299107002 | 0.211654 |
| region | isap:448528897 | 0.175503 |