Premodifier: plasma processingHead noun: apparatus
| Same concepts |
|---|
Broader concepts
| label | provenance | confidence |
|---|---|---|
| plasma processing apparatus | isap:352555134 | 0.551831 |
| method | isap:134443653 | 0.176595 |
Narrower concepts
| label | provenance | confidence |
|---|---|---|
| plasma cvd | isap:263583707 | 0.731859 |
| semiconductor wafer | isap:335647347 | 0.567828 |
| plasma processing apparatus | isap:352555134 | 0.551831 |
| plasma processing method | isap:421373579 | 0.456402 |
| apparatus | isap:352555140 | 0.422460 |
| plasma | isap:422695246 | 0.323985 |
| method | isap:421373599 | 0.241356 |