Premodifier: plasma processingHead noun: apparatus
Same concepts |
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Broader concepts
label | provenance | confidence |
---|---|---|
plasma processing apparatus | isap:352555134 | 0.551831 |
method | isap:134443653 | 0.176595 |
Narrower concepts
label | provenance | confidence |
---|---|---|
plasma cvd | isap:263583707 | 0.731859 |
semiconductor wafer | isap:335647347 | 0.567828 |
plasma processing apparatus | isap:352555134 | 0.551831 |
plasma processing method | isap:421373579 | 0.456402 |
apparatus | isap:352555140 | 0.422460 |
plasma | isap:422695246 | 0.323985 |
method | isap:421373599 | 0.241356 |