Head noun: pecvd
| Same concepts |
|---|
| http://dbpedia.org/resource/Plasma-enhanced_chemical_vapor_deposition |
Broader concepts
| label | provenance | confidence |
|---|---|---|
| process | isap:222274300 | 0.567029 |
| cvd method | isap:163315208 | 0.489473 |
| deposition process | isap:222274302 | 0.425717 |
| deposition technique | isap:335511189 | 0.407020 |
| deposition method | isap:163315207 | 0.388327 |
| known method | isap:163315212 | 0.366736 |
| plasma process | isap:222274303 | 0.365059 |
| conventional method | isap:163315214 | 0.293750 |
| cvd | isap:325849034 | 0.223291 |
| technique | isap:335511188 | 0.195571 |
| method | isap:163315209 | 0.194559 |
| layer | isap:364647987 | 0.165138 |
Narrower concepts
| label | provenance | confidence |
|---|