About: http://webisa.webdatacommons.org/396746211

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The increase of the resist etch resistance is also desirable even at longer wavelengths e.g. 248 nm or 436 nm, since it allows the use of thinner resist films and thus smaller aspect ratios for high resolution patterning.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com