Head noun: photomask
Same concepts |
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http://dbpedia.org/resource/Photomask |
Broader concepts
label | provenance | confidence |
---|---|---|
pattern surface | isap:26423279 | 0.369274 |
optical element | isap:25710914 | 0.350745 |
item | isap:151882661 | 0.348904 |
substrate | isap:354304177 | 0.316918 |
radiation-altering pattern | isap:27255874 | 0.294488 |
material | isap:412641140 | 0.281222 |
article | isap:24509846 | 0.261514 |
present invention | isap:353254758 | 0.233228 |
factor | isap:135842811 | 0.219966 |
device | isap:132922955 | 0.217940 |
photolithography | isap:486942515 | 0.188514 |
mask | isap:151832841 | 0.171109 |
surface | isap:26423278 | 0.168346 |
photomask | isap:352845299 | 0.161027 |
pattern | isap:27255875 | 0.154843 |
sample | isap:132353001 | 0.137830 |
workpiece | isap:352225144 | 0.131178 |
process | isap:25203738 | 0.129369 |
reticle | isap:23800964 | 0.106447 |
size | isap:151195925 | 0.071443 |
Narrower concepts
label | provenance | confidence |
---|---|---|
color filter | isap:423637692 | 0.519568 |
substrate | isap:354164779 | 0.240785 |
method of manufacturing | isap:425102488 | 0.223812 |
mask | isap:285963861 | 0.192546 |
reticle | isap:318755522 | 0.184418 |
photomask | isap:352845299 | 0.161027 |
pattern | isap:319853518 | 0.158061 |
embodiment | isap:193191167 | 0.120390 |
manufacturing | isap:21903614 | 0.090598 |