Premodifier: exposureHead noun: apparatus
Same concepts |
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Broader concepts
label | provenance | confidence |
---|---|---|
lithography apparatus | isap:352555213 | 0.804049 |
exposure apparatus | isap:352555059 | 0.725997 |
optical member | isap:134667218 | 0.700467 |
various apparatus | isap:352555598 | 0.677159 |
apparatus | isap:352555076 | 0.638521 |
optical instrument | isap:43026796 | 0.605791 |
device manufacturing method | isap:134443582 | 0.602047 |
exposure method | isap:134443633 | 0.536291 |
system | isap:135538858 | 0.430921 |
method | isap:134443575 | 0.385276 |
invention | isap:353655151 | 0.340658 |
present invention | isap:353655123 | 0.294766 |
however | isap:24290316 | 0.240952 |
Narrower concepts
label | provenance | confidence |
---|---|---|
exposure apparatus | isap:352555059 | 0.725997 |
optical exposure apparatus | isap:352555374 | 0.706836 |
projection exposure apparatus | isap:352555236 | 0.658461 |
scanning projection exposure apparatus | isap:352555228 | 0.638125 |
exposure light source | isap:421518133 | 0.625671 |
scanning stepper | isap:317472298 | 0.616328 |
optical system | isap:422341538 | 0.586143 |
present invention | isap:351502373 | 0.578287 |
substrate | isap:353139607 | 0.448095 |
illumination optical system | isap:112158055 | 0.432905 |
stage | isap:334686179 | 0.409523 |
fig 7 | isap:262095168 | 0.390830 |
apparatus | isap:352555116 | 0.364151 |
mask | isap:285745116 | 0.279209 |
stepper | isap:317472294 | 0.273853 |
method | isap:421373618 | 0.246304 |
semiconductor | isap:21882134 | 0.242113 |
further | isap:321052332 | 0.186828 |