About: process parameter

Premodifier: process
Head noun: parameter

Same concepts
http://dbpedia.org/resource/Process_variable

Broader concepts

label	provenance	confidence
factor	isap:133234385	0.810829
parameter	isap:354193671	0.689922
several factor	isap:133234408	0.688513
measure process parameter	isap:354193820	0.651979
detail	isap:134434045	0.587028
condition	isap:353964805	0.519922
datum	isap:14594318	0.506862
process	isap:26589899	0.422031
however	isap:24566771	0.187578

Narrower concepts

label	provenance	confidence
gas pressure	isap:183775822	0.888894
gas flow rate	isap:285847431	0.841924
flow rate	isap:285847408	0.839612
chamber pressure	isap:183775765	0.819148
oxide thickness	isap:352237979	0.804837
concentration	isap:22136736	0.799961
temperature	isap:277576364	0.798842
reaction temperature	isap:277576513	0.752680
temperature profile	isap:317951721	0.750286
exposure time	isap:289646373	0.748008
overlay registration	isap:112481873	0.745857
substrate temperature	isap:277576408	0.741163
electrode gap	isap:263547654	0.736255
laser power	isap:339540107	0.731050
process gas	isap:263676790	0.724123
rf power	isap:339540116	0.722776
air flow	isap:289498609	0.721834
reactor pressure	isap:183775799	0.717454
contact time	isap:289646503	0.714914
ph value	isap:336125995	0.706586
hydraulic retention time hrt	isap:264132147	0.703025
mole ratio	isap:337062917	0.698638
process variable	isap:186342306	0.692691
apply pressure	isap:183775803	0.690388
ph	isap:97822036	0.683727
ion flux	isap:285973359	0.680846
rf power level	isap:335069139	0.668983
current density	isap:318737000	0.662631
process temperature	isap:277576494	0.650055
relative humidity	isap:185816550	0.649394
time	isap:289646345	0.644142
annealing temperature	isap:277576851	0.626256
plasma energy	isap:420407972	0.615147
temperature of the substrate	isap:277576757	0.610477
gas flow	isap:289498603	0.588729
electric field	isap:335235951	0.587104
gas composition	isap:277173549	0.576265
composition	isap:277173561	0.568176
number	isap:421876672	0.563424
deposition rate	isap:285847505	0.552724
duration	isap:185589436	0.514406
power	isap:339540114	0.502287
type	isap:288533520	0.488390
depth of cut	isap:335500248	0.456221
pressure	isap:183775669	0.450489
purity	isap:423301449	0.447986
chemistry	isap:352493430	0.431720
profile	isap:317951729	0.430617
velocity	isap:185000040	0.427355
thickness	isap:352237967	0.426765
substrate	isap:353133745	0.417512
dimension	isap:351783440	0.414470
depth	isap:335500240	0.410862
air	isap:262527857	0.410466
force	isap:337354745	0.409588
density	isap:318736956	0.400263
length	isap:420182295	0.400089
speed	isap:338414998	0.395658
size	isap:286181673	0.390571
condition	isap:352128002	0.390061
volume	isap:425541585	0.370489
level	isap:335068939	0.364368
focus	isap:335685155	0.359676
feed	isap:289891037	0.340196
film	isap:288603363	0.335987
flow	isap:289498626	0.334321
like	isap:290138047	0.295857
embodiment	isap:192121876	0.293252
process	isap:316686399	0.273419
valve	isap:337273768	0.255554
dc	isap:98107429	0.254025
method	isap:423215662	0.228422
gas	isap:263676775	0.199686