About: photoresist

Head noun: photoresist

Same concepts
http://dbpedia.org/resource/Photoresist

Broader concepts

label	provenance	confidence
layer	isap:414955909	0.685071
material	isap:463016188	0.627076
suitable masking material	isap:463016213	0.570969
know technique	isap:277992478	0.563177
application	isap:130426538	0.547954
organic polymer	isap:139301226	0.522029
polymeric material	isap:463016192	0.510080
suitable mask material	isap:463016250	0.501084
conventional masking material	isap:463016229	0.500910
process	isap:138364928	0.499343
positive photoresist	isap:130188405	0.497174
masking material	isap:463016233	0.474592
organic material	isap:463016190	0.470648
photosensitive layer	isap:414955910	0.467889
spin-on material	isap:463016199	0.463870
sacrificial layer	isap:414955915	0.459689
processing step	isap:355075038	0.440937
polymer material	isap:463016207	0.440874
use	isap:501278549	0.435118
thin film	isap:355056921	0.432627
sacrificial material	isap:463016194	0.431837
appropriate material	isap:463016223	0.431154
photosensitive material	isap:463016189	0.430571
etch-resistant material	isap:463016226	0.412643
step	isap:355075037	0.410494
variety of material	isap:139737847	0.409933
patternable material	isap:463016196	0.402683
other material	isap:463016197	0.401224
removable material	isap:463016205	0.401113
suitable material	isap:463016191	0.399211
suitable mask	isap:355540889	0.398714
dielectric material	isap:463016200	0.396863
pattern mask layer	isap:414955918	0.393532
soft mask	isap:355540888	0.378301
light sensitive material	isap:415014421	0.367927
area	isap:354707149	0.362859
light-sensitive material	isap:463016203	0.362774
substrate	isap:276981811	0.362610
organic	isap:140376670	0.359714
photosensitive polymer	isap:139301229	0.359460
flowable material	isap:463016210	0.354540
organic compound	isap:462987262	0.352856
chemical	isap:463090658	0.348208
layer of mask material	isap:414955914	0.345495
resist	isap:142648316	0.341536
various use	isap:501278550	0.334354
different material	isap:463016240	0.325812
mask material	isap:463016193	0.317558
polymer	isap:139301225	0.312864
mask layer	isap:414955913	0.310800
layer 16	isap:414955923	0.303773
optical material	isap:463016232	0.295371
dielectric layer	isap:414955926	0.293127
equipment	isap:277402489	0.289703
pattern	isap:140049956	0.279138
residue	isap:139589911	0.273098
art	isap:501367340	0.269409
film	isap:355056920	0.267105
photoresist	isap:130188406	0.264520
photolithography	isap:501727557	0.262571
photopolymer	isap:216550074	0.260581
method	isap:142624445	0.255517
photosensitive composition	isap:130719262	0.255353
product	isap:138445209	0.243543
technique	isap:277992474	0.242167
organic layer	isap:414955933	0.241181
mask	isap:355540886	0.240138
substance	isap:277823252	0.234733
compound	isap:462987263	0.233039
insulator	isap:277692527	0.231122
photolithography process	isap:138364933	0.228888
coating	isap:140281496	0.220246
liquid	isap:144209655	0.215467
fluid	isap:415666948	0.210380
composition	isap:130719259	0.185209
layer 24	isap:414955927	0.181941
embodiment	isap:312658962	0.179033
dry film	isap:355056923	0.176522
however	isap:138748170	0.175618
electronic material	isap:463016222	0.162412
alternatively	isap:109105196	0.161677
example	isap:138302434	0.158363
metal	isap:414799421	0.155885
finally	isap:138710461	0.150712
solvent	isap:137988881	0.141842
nm	isap:241779511	0.136303
contact hole	isap:355226222	0.129349
resin	isap:414014883	0.129183
case	isap:354858890	0.119500
like	isap:355612457	0.116915
thereafter	isap:312993609	0.092147
radiation	isap:277652665	0.090048

Narrower concepts

label	provenance	confidence
photosensitive material	isap:83939755	0.525353
pyrolytic silicon oxide	isap:208758122	0.396506
oxygen plasma	isap:453273595	0.338867
mask	isap:418321144	0.276174
liquid	isap:451256498	0.267806
apply glass	isap:208437331	0.264917
photoresist	isap:130188406	0.264520
novolac	isap:66867186	0.253260
material layer	isap:208752563	0.244758
embodiment	isap:314801428	0.196338
polyimide	isap:979157	0.192435
epoxy	isap:207849959	0.177503
silicon	isap:67068828	0.176640
substrate	isap:104994	0.165538
dielectric	isap:315293763	0.163864
application	isap:130242740	0.117201
example	isap:66231130	0.098197
method	isap:452062947	0.093526